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Constraints on micro-Raman strain metrology for highly doped strained Si materials.
Applied Physics Letters, 92
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ISSN 1077-3118
Cherkaoui, K., Monaghan, S., Negara, M.A., Modreanu, M., Hurley, Paul K. ORCID: 0000-0001-5137-721X, O'Connell, Deborah, McDonnell, Stephen, Hughes, Greg
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Electrical, structural, and chemical properties of HfO₂ films formed by electron beam evaporation.
Journal of Applied Physics, 104
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064113-1.
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